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DESIGN FOR MANUFACTURABILITY AND YIELD FOR NANO-SCALE CMOS

DESIGN FOR MANUFACTURABILITY AND YIELD FOR NANO-SCALE CMOS

CHARLES C. CHIANG;JAMIL KAWA
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“Tools alone aren't enough to reduce dynamic and leakage power in complex chip designs - a well-planned methodology is needed. Following in the footsteps of the successful Reuse Methodology Manual (RMM), authors from ARM and Synopsys have written this Low Power Methodology Manual (LPMM) to describe [such] [a] low-power methodology with a practical, step-by-step approach.”

Richard Goering, Software Editor, EE Times

“Excellent compendium of low-power techniques and guidelines with balanced content spanning theory and practical implementation. The LPMM is a very welcome addition to the field of low power SoC implementation that has for many years operated in a largely ad-hoc fashion.”

Sujeeth Joseph, Chief Architect - Semiconductor and Systems Solutions Unit, Wipro Technologies

“The LPMM enables broader adoption of aggressive power management techniques based on extensive experience and silicon example with real data that every SOC designer can use to meet the difficulties faced in managing the power issues in deep submicron designs.”

Anil Mankar, Sr VP Worldwide Core Engineering and Chief Development Officer, Conexant Systems Inc.

“Managing power, at 90nm and below, introduces significant challenges to design flow. The LPMM is a timely and immediately useful book that shows how combination of tools, IP and methodology can be used together to address power management.”

Nick Salter, Head of Chip Integration, CSR plc.

种类:
年:
2007
出版社:
Springer
语言:
english
页:
277
ISBN 10:
038736837X
ISBN 13:
9780387718187
系列:
Integrated Circuits and Systems
文件:
PDF, 12.57 MB
IPFS:
CID , CID Blake2b
english, 2007
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